-od diffusion stand for "oxide diffusion". It defines active area: source, drain and those under gate OD: field ox define Isolation for active area define
-whats the significant of epitaxial layer in cmos ic fabrication. why cant the ic is directly manufactured on the P-substrate? If done so, what are the effects? Is formation of epitaxial layer on the P-substrate is necessary? =The use of the epitaxial laver is not so much about the device quality (bulk P- would do as well, for explicit FET qualities) but the abnormal - latchup especially. Epi is how you get a high resistivity device layer on a heavily doped handle, that does a better job of shunting parasitic BJTs and much eases latchup prevention.
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